Helios 5 PFIB DualBeam

The Thermo Scientific Helios 5 Plasma FIB (PFIB) DualBeam (focused ion beam scanning electron microscope, or FIB-SEM) delivers unmatched capabilities for materials science and semiconductor applications. For materials science researchers, the Helios 5 PFIB DualBeam provides large-volume 3D characterization, gallium-free sample preparation, and precise micromachining. For manufacturers of semiconductor devices, advanced packaging technology, and display devices, the Helios 5 PFIB DualBeam delivers damage-free, large-area de-processing, fast sample preparation, and high-fidelity failure analysis.

Key Features  For Materials Science :

– Gallium-free STEM and TEM sample preparation
– Next-generation 2.5 μA xenon plasma FIB column
– Sub-nanometer performance at low energies
– Advanced capabilities
– Short time to nanoscale information
– Advanced automation
– Multi-modal subsurface and 3D information
– Complete sample information
– Artifact-free imaging
– Precise sample navigation

Key Features  For Semiconductors :

– Semiconductor device deprocessing
– TEM sample preparation
– Advanced automation
– Artifact-free imaging
– High-speed, large-area cross-sectioning
– Sub-nanometer, low-energy SEM performance
– Complete sample information
– Precise sample navigation

For more info click here (https://www.thermofisher.com/id/en/home/electron-microscopy/products/dualbeam-fib-sem-microscopes/helios-5-pfib-dualbeam.html)